- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/213 - Exposing with the same light pattern different positions of the same surface at the same time
Patent holdings for IPC class G03F 7/213
Total number of patents in this class: 26
10-year publication summary
1
|
1
|
1
|
5
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6
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4
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2
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1
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2
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1
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2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 6816 |
3 |
Nikon Corporation | 7162 |
2 |
Cymer, LLC | 347 |
2 |
EV Group E. Thallner GmbH | 376 |
2 |
Samsung Display Co., Ltd. | 30585 |
1 |
Applied Materials, Inc. | 16587 |
1 |
Huawei Technologies Co., Ltd. | 100781 |
1 |
The Board of Trustees of the Leland Stanford Junior University | 6054 |
1 |
Board of Regents, The University of Texas System | 5370 |
1 |
The Arizona Board of Regents on Behalf of the University of Arizona | 1906 |
1 |
Danmarks Tekniske Universitet | 902 |
1 |
Ecole Polytechnique Federale de Lausanne (epfl) | 1434 |
1 |
IMS Nanofabrication GmbH | 56 |
1 |
National University of Singapore | 2228 |
1 |
Nova Measuring Instruments Ltd. | 73 |
1 |
Ushio Denki Kabushiki Kaisha | 1088 |
1 |
Xeikon Prepress NV | 32 |
1 |
TERA-print, LLC | 8 |
1 |
PlayNitride Display Co., Ltd. | 273 |
1 |
Onto Innovation Inc. | 340 |
1 |
Other owners | 1 |